METHOD FOR MANUFACTURING SILICA LAYER SILICA LAYER AND ELECTRONIC DEVICE

The present invention relates to a manufacturing method of a silica film which comprises the following steps of: applying a liquid material for pre-wetting including a carbon compound onto a substrate; applying a composition for forming a silica film onto the substrate onto which the liquid material...

Full description

Saved in:
Bibliographic Details
Main Authors BAE, JIN HEE, NOH, KUN BAE, LEE, JI HO, YUN, HUI CHAN, LIM, WAN HEE
Format Patent
LanguageEnglish
Korean
Published 04.04.2017
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:The present invention relates to a manufacturing method of a silica film which comprises the following steps of: applying a liquid material for pre-wetting including a carbon compound onto a substrate; applying a composition for forming a silica film onto the substrate onto which the liquid material for pre-wetting is applied; and hardening the substrate onto which the composition for forming a silica film is applied. 기판 위에 탄소 화합물을 포함하는 프리웨팅(pre-wetting)용 액상물질을 도포하는 단계, 프리웨팅용 액상 물질이 도포된 기판 위에 실리카 막　형성용 조성물을 도포하는 단계, 그리고 상기 실리카 막 형성용 조성물이 도포된 기판을 경화하는 단계를 포함하는 실리카 막의 제조방법에 관한 것이다.
Bibliography:Application Number: KR20150137077