PHENOLIC HYDROXYL GROUP-CONTAINING RESIN PRODUCTION METHOD THEREFOR PHOTOSENSITIVE COMPOSITION RESIST MATERIAL COATING FILM CURABLE COMPOSITION AND CURED PRODUCT THEREOF AND RESIST UNDERLAYER FILM

• Main Authors: IMADA TOMOYUKI, KIMOTO SEIJI, KIDA SHIGENOBU
• Format: Patent
• Language: English; Korean
• Published: 22.03.2017
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; ELECTROGRAPHY; FILLING PASTES; HOLOGRAPHY; INKS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

알칼리 현상성이 우수하고, 얻어지는 경화물에 있어서 높은 내열성을 발현시킬 수 있는 페놀성 수산기 함유 수지, 그 제조 방법, 감광성 조성물, 레지스트 재료, 도막, 경화성 조성물과 그 경화물, 및 레지스트 하층막을 제공하는 것. 하기 구조식(1)(식 중, R은 알킬기, 알콕시기 또는 아릴기이고, R은 수소 원자, 알킬기 또는 아릴기이고, m은 1∼3의 정수, n은 2∼15의 정수이다. m이 2 이상일 경우, 복수의 R은 각각 동일해도 되며 달라도 된다) 으로 표시되는 분자 구조를 갖는 화합물(A)을 함유하는 것을 특징으로 하는 페놀성 수산기 함유 수지. (In the formula, R1 represents an alkyl group, an alkoxy group, or an aryl group, R2 represents a hydrogen atom, an alkyl group, or an aryl group, m is an integer of 1 to 3, and n is an integer of 2 to 15. In the case where m is 2 or more, plural R1's may be the same as or different from each other.)