SUBSTRATE PROCESSING SYSTEM ION IMPLANTATION SYSTEM AND BEAMLINE ION IMPLANTATION SYSTEM

• Main Author: BLAKE JULIAN
• Format: Patent
• Language: English; Korean
• Published: 15.03.2017
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

기판 프로세싱 시스템, 이온 주입 시스템, 및 빔라인 이온 주입 시스템이 제공된다. 텍스처링된 실리콘 라이너들을 갖는, 이온 주입 시스템들, 증착 시스템들 및 에칭 시스템들과 같은 기판 프로세싱 시스템들이 개시된다. 실리콘 라이너들은, 20 마이크로미터 미만의 높이일 수 있는 마이크로피라미드(micropyramid)들로서 지칭되는 작은 특징부들을 생성하는 화학적 처리를 사용하여 텍스처링된다. 이러한 마이크로피라미드들이 흑연 라이너들에서 일반적으로 발견되는 텍스처링된 특징부들보다 훨씬 더 작다는 사실에도 불구하고, 텍스처링된 실리콘은 증착된 코팅들을 홀딩하고 조각으로 벗겨지는 것에 저항할 수 있다. Substrate processing systems, such as ion implantation systems, deposition systems and etch systems, having textured silicon liners are disclosed. The silicon liners are textured using a chemical treatment that produces small features, referred to as micropyramids, which may be less than 20 micrometers in height. Despite the fact that these micropyramids are much smaller than the textured features commonly found in graphite liners, the textured silicon is able to hold deposited coatings and resist flaking. Methods for performing preventative maintenance on these substrate processing systems are also disclosed.