PLASTIC SUBSTRATES HAVING A SILICON COATING

• Main Authors: FORSTPOINTNER GERHARD, BAUMANN BERNHARD, FRICKE MICHAEL
• Format: Patent
• Language: English; Korean
• Published: 06.03.2017
• Subjects: AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CRYSTAL GROWTH; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; REFINING BY ZONE-MELTING OF MATERIAL; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; SINGLE-CRYSTAL-GROWTH; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL

본 발명은, 기재의 플라스틱재 함유 표면을 저온 가스 분무에 의해 실리콘 코팅하는 방법으로서, 실리콘을 포함하는 분말을 가스 내에 주입하는 단계, 및 상기 분말을, 플라스틱재를 함유하는 기재 표면에 고속으로 도포함으로써, 실리콘이 플라스틱재를 함유하는 기재 표면 상에 (견고히 부착된) 코트를 형성하는 단계를 포함하는 방법에 관한 것이다. 또한, 본 발명은 플라스틱재로 제조된 표면을 적어도 부분적으로 포함하는 장치로서, 플라스틱재 표면은 견고히 부착된 실리콘 코트를 갖는 것인 장치에 관한 것이다. Plastic material-comprising surfaces of a substrate are coated with elemental silicon by cold gas spraying by injecting a powder containing silicon into a gas and powder with a high velocity onto the substrate surface, such that the silicon forms a firmly adherent coat on the substrate surface comprising the plastics material. Apparatuses having such silicon-coated surfaces are useful in minimizing contamination of polycrystalline silicon production, processing, packaging, and transport.