METHODS FOR FABRICATING A CHEMICAL-MECHANICAL POLISHING COMPOSITION

• Main Authors: CAVANAUGH MARY, SHEN ERNEST, GRUMBINE STEVEN, DYSARD JEFFREY, CLINGERMAN DANIEL
• Format: Patent
• Language: English; Korean
• Published: 27.02.2017
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMISTRY; DRESSING OR CONDITIONING OF ABRADING SURFACES; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PERFORMING OPERATIONS; POLISHES; POLISHING; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SEMICONDUCTOR DEVICES; SKI WAXES; TRANSPORTING

화학적-기계적 연마 조성물의 제조 방법은, 아미노실란 화합물이 연마제 입자 내에 혼입되도록 아미노실란 화합물을 포함하는 액체 중에서 콜로이드성 실리카 연마제 입자를 성장시키는 것을 포함한다. 상기와 같은 콜로이드성 실리카 연마제 입자를 포함하는 분산액을 추가로 가공하여, 아미노실란 화합물이 그 안에 혼입된 콜로이드성 실리카 입자를 포함하는 화학적-기계적 연마 조성물을 수득할 수 있다. Methods for fabricating a chemical-mechanical polishing composition include growing colloidal silica abrasive particles in a liquid including an aminosilane compound such that the aminosilane compound becomes incorporated in the abrasive particles. A dispersion including such colloidal silica abrasive particles may be further processed to obtain a chemical-mechanical polishing composition including colloidal silica particles having the aminosilane compound incorporated therein.