APPARATUS FOR THIN FILM DEPOSITION
A thin film depositing apparatus according to an embodiment of the present invention includes a chamber, a susceptor which supports and rotates the substrate inside the chamber, a reflection housing which is arranged outside the chamber, a light source unit which is arranged on the upper side of the...
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Main Authors | , , , , , , , |
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Format | Patent |
Language | English Korean |
Published |
14.02.2017
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Subjects | |
Online Access | Get full text |
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Summary: | A thin film depositing apparatus according to an embodiment of the present invention includes a chamber, a susceptor which supports and rotates the substrate inside the chamber, a reflection housing which is arranged outside the chamber, a light source unit which is arranged on the upper side of the substrate inside the reflection housing and emits light to the substrate, and a light control unit which is arranged inside the reflection housing and controls the emission region of the light on the substrate by blocking at least a part of an emission path of the light. Accordingly, the present invention can form a thin film with a uniform thickness and heat the substrate at a uniform temperature.
본 발명의 일 실시예에 따른 박막 증착 장치는, 챔버, 상기 챔버 내에서 기판을 지지 및 회전시키는 서셉터, 상기 챔버 외측에 배치되는 반사 하우징, 상기 반사 하우징 내 상기 기판의 상부에 배치되고, 상기 기판으로 광을 조사하는 광원부, 그리고 상기 반사 하우징 내 배치되고, 상기 광의 조사 경로의 적어도 일부를 차단하여 상기 기판 상의 상기 광의 조사 영역을 조절하는 광 조절부를 포함한다. |
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Bibliography: | Application Number: KR20150109641 |