APPARATUS FOR THIN FILM DEPOSITION

A thin film depositing apparatus according to an embodiment of the present invention includes a chamber, a susceptor which supports and rotates the substrate inside the chamber, a reflection housing which is arranged outside the chamber, a light source unit which is arranged on the upper side of the...

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Main Authors LEE, JAE BONG, KIM, CHAE HO, SON, JI SU, LIM, JU WAN, JEONG, HEE JONG, RYU, SEUNG MIN, CHOI, JUNG WOO, LEE, SANG MIN
Format Patent
LanguageEnglish
Korean
Published 14.02.2017
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A thin film depositing apparatus according to an embodiment of the present invention includes a chamber, a susceptor which supports and rotates the substrate inside the chamber, a reflection housing which is arranged outside the chamber, a light source unit which is arranged on the upper side of the substrate inside the reflection housing and emits light to the substrate, and a light control unit which is arranged inside the reflection housing and controls the emission region of the light on the substrate by blocking at least a part of an emission path of the light. Accordingly, the present invention can form a thin film with a uniform thickness and heat the substrate at a uniform temperature. 본 발명의 일 실시예에 따른 박막 증착 장치는, 챔버, 상기 챔버 내에서 기판을 지지 및 회전시키는 서셉터, 상기 챔버 외측에 배치되는 반사 하우징, 상기 반사 하우징 내 상기 기판의 상부에 배치되고, 상기 기판으로 광을 조사하는 광원부, 그리고 상기 반사 하우징 내 배치되고, 상기 광의 조사 경로의 적어도 일부를 차단하여 상기 기판 상의 상기 광의 조사 영역을 조절하는 광 조절부를 포함한다.
Bibliography:Application Number: KR20150109641