LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING A LITHOGRAPHIC APPARATUS

• Main Authors: BERENDSEN CHRISTIANUS WILHELMUS JOHANNES, JEUNINK ANDRE BERNARDUS, OVERKAMP JIM VINCENT, TROMP SIEGFRIED ALEXANDER, KOEVOETS ADRIANUS HENDRIK, AUDENAERDT DANIEL ELZA ROELAND, CORTIE ROGIER HENDRIKUS MAGDALENA, VY VAN VUONG
• Format: Patent
• Language: English; Korean
• Published: 13.02.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

리소그래피 장치는: 2-상 유동의 통행을 위한 채널(46) - 채널은 블록 내에 형성되고, 블록은 제 1 재료(100)로 되어 있음 -; 제 1 재료와 채널 사이의 제 2 재료(160) - 제 2 재료는 제 1 재료의 비열용량보다 높은 비열용량을 가짐 -; 및 제 2 재료와 채널 사이의 제 3 재료(90) - 제 3 재료는 제 2 재료의 열 전도율보다 높은 열 전도율을 가짐 - 를 포함한다. A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.