SELF-CENTERING WAFER CARRIER SYSTEM FOR CHEMICAL VAPOR DEPOSITION

A self-centering wafer carrier system for a chemical vapor deposition (CVD) reactor includes a wafer carrier including an edge. The wafer carrier at least partially supports the wafer for CVD processing. A rotating tube includes an edge supporting the water carrier during the processing. The edge sh...

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Bibliographic Details
Main Authors KRISHNAN SANDEEP, GURARY ALEXANDER I, MARCELO EARL, CHANG CHENGHUNG PAUL
Format Patent
LanguageEnglish
Korean
Published 30.12.2016
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A self-centering wafer carrier system for a chemical vapor deposition (CVD) reactor includes a wafer carrier including an edge. The wafer carrier at least partially supports the wafer for CVD processing. A rotating tube includes an edge supporting the water carrier during the processing. The edge shape part of the wafer carrier and the edge shape part of the rotating tube are selected to provide the matching alignment of the central axis of the wafer carrier with the rotational axis of the rotating tube during the processing at a desired process temperature. 화학 기상 증착(CVD) 반응기를 위한 자기중심조정 웨이퍼 캐리어 시스템은 에지를 포함하는 웨이퍼 캐리어를 포함한다. 웨이퍼 캐리어는 CVD 처리를 위해 웨이퍼를 적어도 부분적으로 지지한다. 회전 튜브는 처리 동안 웨이퍼 캐리어를 지지하는 에지를 포함한다. 웨이퍼 캐리어의 에지 형상부와 회전 튜브의 에지 형상부는, 원하는 공정 온도에서 공정 동안 웨이퍼 캐리어의 중심축과 회전 튜브의 회전축의 일치 정렬을 제공하도록 선택된다.
Bibliography:Application Number: KR20160078282