SEMICONDUCTOR DEVICES

A semiconductor device includes: a plurality of wiring structures spaced from each other; a protective film pattern formed on each of the wiring structures to protect the same, and including a metal nitride; a spacer formed on a side wall of the protective film pattern; and an inter layer dielectric...

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Bibliographic Details
Main Authors SIEW YONG KONG, AHN SANG HOON
Format Patent
LanguageEnglish
Korean
Published 26.12.2016
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A semiconductor device includes: a plurality of wiring structures spaced from each other; a protective film pattern formed on each of the wiring structures to protect the same, and including a metal nitride; a spacer formed on a side wall of the protective film pattern; and an inter layer dielectric structure accommodating the wiring structures and having an air gap between the wiring structures. 반도체 장치는 서로 이격된 복수의 배선 구조물들, 각 배선 구조물들 상에 형성되어 이를 보호하며 금속 질화물을 포함하는 보호막 패턴, 보호막 패턴의 측벽에 형성된 스페이서, 및 배선 구조물들을 수용하며 배선 구조물들 사이에 에어 갭을 갖는 층간 절연막 구조물을 포함한다.
Bibliography:Application Number: KR20150084755