Semiconductor device
The present invention relates to a semiconductor device and a manufacturing method thereof. Provided is the semiconductor device which includes an active pattern which protrudes from a substrate, a gate electrode which crosses the active pattern, a gate spacer on the sidewalls of the gate electrode,...
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Main Authors | , , , , |
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Format | Patent |
Language | English Korean |
Published |
15.12.2016
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Subjects | |
Online Access | Get full text |
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