STAGE SYSTEM EXPOSURE APPARATUS AND EXPOSURE METHOD

• Main Authors: KOHNO HIROTAKA, SHIRAISHI KENICHI, NISHII YASUFUMI
• Format: Patent
• Language: English; Korean
• Published: 06.12.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

이 스테이지 장치 (PST) 는, 기판 (P) 을 유지하는 기판 유지면 (33A) 을 갖는 홀더 (PH) 와, 홀더 (PH) 를 지지하여 이동하는 스테이지 (52) 를 구비하고, 또한, 홀더 (PH) 근방에 배치되며, 적어도 일부가 친액성을 갖는 친액부 (3, 5) 를 갖고, 친액부 (3, 5) 를 사용하여 액체 (1) 를 회수하는 회수 장치 (60) 를 구비한다. 그 결과, 투영 광학계와 기판 사이를 액체로 채워서 노광 처리하는 경우에 있어서도, 기판과 홀더 사이에 액체가 침입하는 경우가 방지된다. A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus 60, which is disposed in the vicinity of the holder PH and has lyophilic parts 3, 5 of which at least a part of each is lyophilic, that uses the lyophilic parts 3, 5 to recover a liquid 1. As a result, the infiltration of liquid into the space between the substrate and the holder is prevented, even if performing an exposure treatment by filling the space between a projection optical system and the substrate with the liquid.