RESIST STRIPPER COMPOSITION

The present invention relates to a resist stripper composition and, more specifically, to a resist stripper composition having the excellent detergency of a resist and inhibiting precipitation at high temperatures by comprising potassium hydroxide, a polar deprotonated solvent, water, and polyethyle...

Full description

Saved in:
Bibliographic Details
Main Authors PANG, SOON HONG, HONG, HUN PYO, CHOI, HAN YOUNG
Format Patent
LanguageEnglish
Korean
Published 06.12.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:The present invention relates to a resist stripper composition and, more specifically, to a resist stripper composition having the excellent detergency of a resist and inhibiting precipitation at high temperatures by comprising potassium hydroxide, a polar deprotonated solvent, water, and polyethyleneimine. 본 발명은 레지스트 박리액 조성물에 관한 것으로서, 보다 상세하게는, 수산화칼륨, 극성 비양자성 용매, 물 및 폴리에틸렌이민을 포함함으로써, 레지스트의 세정성이 우수하고, 고온에서도 침전의 발생이 억제된 레지스트 박리액 조성물에 관한 것이다.
Bibliography:Application Number: KR20150072950