METHOD FOR MANUFACTURING MATERIAL FOR CYLINDRICAL SPUTTERING TARGET

• Main Authors: SONOHATA TAKASHI, KUMAGAI SATOSHI, OHTO MICHIAKI, SAKURAI AKIRA
• Format: Patent
• Language: English; Korean
• Published: 22.11.2016
• Subjects: ALLOYS; BASIC ELECTRIC ELEMENTS; CASTING; CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES; CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; FERROUS OR NON-FERROUS ALLOYS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUSMETALS OR ALLOYS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MAKING METAL MALLEABLE BY DECARBURISATION, TEMPERING OR OTHERTREATMENTS; MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVINGMATERIAL; METALLURGY; METALLURGY OF IRON; MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; PERFORMING OPERATIONS; POWDER METALLURGY; PUNCHING METAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING; TREATMENT OF ALLOYS OR NON-FERROUS METALS; WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS ORPROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL

구리 또는 구리 합금으로 이루어지는 원통형 스퍼터링 타깃용 소재의 제조 방법으로서, 연속 주조기 또는 반연속 주조기를 사용하여, 평균 결정 입경이 20 ㎜ 이하인 원통상 주괴를 주조하는 연속 주조 공정과, 이 원통상 주괴에 대하여 냉간 가공과 열처리를 반복하여 실시함으로써, 외주면에 있어서의 평균 결정 입경이 10 ㎛ 이상 150 ㎛ 이하, 또한, 평균 결정 입경에 대하여 2 배 이상의 결정립이 차지하는 면적 비율이 전체 결정 면적의 25 ％ 미만으로 된 상기 원통형 스퍼터링 타깃용 소재를 성형하는 냉간 가공 공정 및 열처리 공정을 구비하고 있다. A manufacturing method of a cylindrical sputtering target material formed of copper or a copper alloy is provided, the method including: a continuous casting step of casting a cylindrical ingot having an average crystal grain diameter equal to or smaller than 20 mm using a continuous casting machine or a semi-continuous casting machine; and a cold working step and a heat treatment step of repeatedly performing cold working and a heat treatment with respect to the cylindrical ingot, to form the cylindrical sputtering target material in which an average crystal grain diameter of an outer peripheral surface is from 10 μm to 150 μm and a proportion of the area of crystal grains having a crystal grain diameter more than double the average crystal grain diameter is less than 25% of the entire crystal area.