METHOD FOR PRODUCING PURE OCTACHLOROTRISILANE AND DECACHLOROTETRASILANES

• Main Authors: RAULEDER HARTWIG, LANG JUERGEN ERWIN, GOETZ CHRISTIAN, UEHLENBRUCK GOSWIN, MARINAS PEREZ JANAINA
• Format: Patent
• Language: English; Korean
• Published: 08.11.2016
• Subjects: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; CHEMISTRY; COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F; COMPOUNDS THEREOF; INORGANIC CHEMISTRY; METALLURGY; NON-METALLIC ELEMENTS; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; THEIR RELEVANT APPARATUS; TRANSPORTING

본 발명은 3원 및/또는 4원 규소 화합물 또는 3원 및/또는 4원 게르마늄 화합물을 제조하기 위한 방법에 관한 것이다. 규소 화합물의 혼합물 및/또는 게르마늄 화합물의 혼합물을 비열 플라즈마에 노출시키고 생성된 상을 1번 이상 진공 정류 및 여과시킨다. The invention relates to a process for producing trimeric and/or quaternary silicon compounds or trimeric and/or quaternary germanium compounds, where a mixture of silicon compounds or a mixture of germanium compounds is exposed to a nonthermal plasma, and the resulting phase is subjected at least once to a vacuum rectification and filtration.