CVD METAL-FREE CVD COATING OF GRAPHENE ON GLASS AND OTHER DIELECTRIC SUBSTRATES

• Main Authors: SONG ZHEN, MANLEY ROBERT GEORGE, MORENA ROBERT MICHAEL, LIU XINYUAN
• Format: Patent
• Language: English; Korean
• Published: 28.10.2016
• Subjects: ARTIFICIAL STONE; CEMENTS; CERAMICS; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS; COMPOUNDS THEREOF; CONCRETE; GLASS; INORGANIC CHEMISTRY; JOINING GLASS TO GLASS OR OTHER MATERIALS; LIME, MAGNESIA; METALLURGY; MINERAL OR SLAG WOOL; NON-METALLIC ELEMENTS; REFRACTORIES; SLAG; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; TREATMENT OF NATURAL STONE

그래핀을 형성하기 위한 촉매-부재 CVD 방법. 상기 방법은, 반응 챔버 내에 기판을 놓는 단계, 상기 기판을 600℃ 내지 1100℃의 온도로 가열하는 단계, 및 상기 챔버로 탄소 전구체를 도입하는 단계 및 상기 기판의 표면상에 그래핀 층을 형성시키는 단계를 포함한다. 상기 방법은 금속 촉매 또는 플라즈마를 사용하지 않고 그래핀을 형성한다. A catalyst-free CVD method for forming graphene. The method involves placing a substrate within a reaction chamber, heating the substrate to a temperature between 600° C. and 1100° C., and introducing a carbon precursor into the chamber to form a graphene layer on a surface of the substrate. The method does not use plasma or a metal catalyst to form the graphene.