Manufacturing Method oF High Purity Cylindrical Mold Substrate For Nano Pattern Formation

The present invention relates to a manufacturing method of a high-purity cylindrical mold substrate for forming a nanopattern, more specifically comprising the following steps of: lapping and processing an outer circumferential surface of a cylindrical alloy mold substrate; polishing and processing...

Full description

Saved in:
Bibliographic Details
Main Authors SHIN, MYUNG DONG, KIM, SUNG HOON, SEO, SANG HYUN, CHAE, JOO HYUN
Format Patent
LanguageEnglish
Korean
Published 24.10.2016
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:The present invention relates to a manufacturing method of a high-purity cylindrical mold substrate for forming a nanopattern, more specifically comprising the following steps of: lapping and processing an outer circumferential surface of a cylindrical alloy mold substrate; polishing and processing the outer circumferential surface of the lapped and processed cylindrical alloy mold substrate; and depositing high-purity aluminum on the outer circumferential surface of the polished and processed cylindrical alloy mold substrate. Provided in the present invention is the method for manufacturing the high-purity cylindrical mold substrate used in the manufacture of a nanomaster for a nanoimprinting process in an effective manner. 본 발명은 나노 패턴 형성용 고 순도 원통형 금형 기재의 제조방법에 관한 것으로, 보다 구체적으로 원통형 합금 금형 기재의 외주면 표면을 랩핑(lapping) 가공하는 단계; 상기 랩핑 가공된 원통형 합금 금형 기재의 외주면 표면을 폴리싱(polishing) 가공하는 단계; 및 상기 폴리싱 가공된 원통형 합금 금형 기재의 외주면 표면에 스퍼터링 공정을 이용하여 고 순도의 알루미늄을 증착하는 단계;를 포함한다.
Bibliography:Application Number: KR20150052739