Manufacturing Method oF High Purity Cylindrical Mold Substrate For Nano Pattern Formation
The present invention relates to a manufacturing method of a high-purity cylindrical mold substrate for forming a nanopattern, more specifically comprising the following steps of: lapping and processing an outer circumferential surface of a cylindrical alloy mold substrate; polishing and processing...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
24.10.2016
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention relates to a manufacturing method of a high-purity cylindrical mold substrate for forming a nanopattern, more specifically comprising the following steps of: lapping and processing an outer circumferential surface of a cylindrical alloy mold substrate; polishing and processing the outer circumferential surface of the lapped and processed cylindrical alloy mold substrate; and depositing high-purity aluminum on the outer circumferential surface of the polished and processed cylindrical alloy mold substrate. Provided in the present invention is the method for manufacturing the high-purity cylindrical mold substrate used in the manufacture of a nanomaster for a nanoimprinting process in an effective manner.
본 발명은 나노 패턴 형성용 고 순도 원통형 금형 기재의 제조방법에 관한 것으로, 보다 구체적으로 원통형 합금 금형 기재의 외주면 표면을 랩핑(lapping) 가공하는 단계; 상기 랩핑 가공된 원통형 합금 금형 기재의 외주면 표면을 폴리싱(polishing) 가공하는 단계; 및 상기 폴리싱 가공된 원통형 합금 금형 기재의 외주면 표면에 스퍼터링 공정을 이용하여 고 순도의 알루미늄을 증착하는 단계;를 포함한다. |
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Bibliography: | Application Number: KR20150052739 |