UV METHOD FOR PRODUCING A UV PHOTODETECTOR

• Main Authors: DESHMUKH RANJAN DEEPAK, MISKIEWICZ PAWEL, ALBRECHT THOMAS, HOOKER REBEKAH, BONRAD KLAUS, KLYSZCZ ANDREAS
• Format: Patent
• Language: English; Korean
• Published: 11.10.2016
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

본 발명은 액상을 갖는 전구체 계의 데포지션에 기초하여 광검출기를 제조하는 방법에 관한 것이다. 광검출기들은 솔라-블라인드 UV 검출기들에서 흡수체로 사용될 수 있는 반도체 재료들의 소정 그룹으로 특징된다. 이러한 흡수체 재료들의 박층들의 형성을 위한 용이한 루트가 개시된다. This invention relates to a method for producing a photodetector based on the deposition of precursor system having a liquid phase. The photodetectors are characterized by a certain group of semiconductor materials which can be used as the absorber in solar-blind UV detectors. A facile route for the formation of thin layers of such absorber materials is disclosed.