EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE

• Main Authors: NAGASAKA HIROYUKI, KUDO YOSHIHIKO, TAKAIWA HIROAKI, KOHNO HIROTAKA, NEI MASAHIRO, OWA SOICHI, SHIRAISHI KENICHI, INOUE JIRO, HIRUKAWA SHIGERU, NISHII YASUFUMI, MAGOME NOBUTAKA, IMAI MOTOKATSU
• Format: Patent
• Language: English; Korean
• Published: 30.09.2016
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

투영광학계 (PL) 와 액체 (1) 를 통해 패턴의 이미지를 기판 (P) 상에 투영함으로써 기판 (P) 을 노광할 때, 기판 (P) 의 측면 (PB), 이면 (PC) 을 발액 처리한다. 이러한 구성에 의해 기판의 에지 영역을 액침 노광하는 경우에 양호하게 액침 영역을 형성하여, 액체의 기판 스테이지 외부로의 유출을 억제한 상태에서 노광할 수 있는 노광 방법을 제공한다. In exposing substrate P by projecting an image of a pattern onto substrate P via projection optical system PL and liquid 1, side surface PB and underside surface PC of substrate P are applied with liquid-repellent treatment By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.