INTEGRATED CIRCUIT DEVICE AND METHOD OF MANUFACTURING THE SAME

An integrated circuit device comprises first and second fin-type active regions having different conductive type channel regions wherein a first device isolation layer covers both sidewalls of the first fin-type active region, and a second device isolation layer covers both sidewalls of the second f...

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Bibliographic Details
Main Authors KIM, HYUN JO, RHEE, HWA SUNG, LEE, YOON SEOK, JEONG, HEE DON, JEONG, BO CHEOL, CHUNG, JAE YUP, PARK, SE WAN
Format Patent
LanguageEnglish
Korean
Published 01.09.2016
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