INTEGRATED CIRCUIT DEVICE AND METHOD OF MANUFACTURING THE SAME
An integrated circuit device comprises first and second fin-type active regions having different conductive type channel regions wherein a first device isolation layer covers both sidewalls of the first fin-type active region, and a second device isolation layer covers both sidewalls of the second f...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English Korean |
Published |
01.09.2016
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Subjects | |
Online Access | Get full text |
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