POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS

• Main Authors: MUN, SOO HYOUN, HEO, YU MI, KIM, SEUNG HYUN, KWON, HYO YOUNG, JUNG, HYEON IL, NAMGUNG, RAN, RATHWELL DOMINEA
• Format: Patent
• Language: English; Korean
• Published: 25.08.2016
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; GENERAL PROCESSES OF COMPOUNDING; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP; WORKING-UP

The present invention relates to a polymer comprising a part represented by chemical formula 1, an organic film composition comprising the polymer, an organic film manufactured from the organic film composition, and a method to form patterns using the organic film composition. The definition of chemical formula 1 is the same as defined in the specification. 화학식 1로 표현되는 부분을 포함하는 중합체, 상기 중합체를 포함하는 유기막 조성물, 상기 유기막 조성물로부터 제조된 유기막, 및 상기 유기막 조성물을 사용하는 패턴형성방법에 관한 것이다. 상기 화학식 1의 정의는 명세서 내에 기재한 바와 같다.