COPPER-TITANIUM ALLOY FOR ELECTRONIC COMPONENT

• Main Author: HORIE HIROYASU
• Format: Patent
• Language: English; Korean
• Published: 16.08.2016
• Subjects: ALLOYS; BASIC ELECTRIC ELEMENTS; CABLES; CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS; CHEMISTRY; CONDUCTORS; ELECTRICITY; FERROUS OR NON-FERROUS ALLOYS; INSULATORS; MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVINGMATERIAL; METALLURGY; PERFORMING OPERATIONS; PUNCHING METAL; ROLLING OF METAL; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES; TRANSPORTING; TREATMENT OF ALLOYS OR NON-FERROUS METALS

티탄구리에 있어서, Ti 농도의 변동을 종래와는 다른 관점에서 제어하고, 강도 및 굽힘 가공성의 향상을 도모한다. Ti 를 2.0 ∼ 4.0 질량％ 함유하고, 제 3 원소로서 Fe, Co, Mg, Si, Ni, Cr, Zr, Mo, V, Nb, Mn, B 및 P 로 이루어지는 군에서 선택된 1 종 이상을 합계로 0 ∼ 0.5 질량％ 함유하고, 잔부가 구리 및 불가피적 불순물로 이루어지는 전자 부품용 티탄구리로서, 압연 방향에 평행한 단면에 있어서의 ＜100＞ 방위의 결정립에 대해 모상 중의 Ti 를 EDX 에 의해 라인 분석하였을 때에 얻어지는 Ti 농도의 변동 곡선에 있어서의 변동 계수가 0.2 ∼ 0.8 이고, 또한 압연 방향에 평행한 단면의 조직 관찰에 있어서의 크기가 3 ㎛ 이상인 제 2 상 입자의 관찰 시야 10000 ㎛당의 개수가 35 개 이하인 티탄구리. The present invention controls the fluctuations of Ti concentration in a copper titanium alloy from a perspective different from conventional perspectives to improve the strength and bending workability of the copper titanium alloy. A copper titanium alloy for electronic components comprising 2.0 to 4.0 mass % of Ti, and 0 to 0.5 mass %, in total, of one or more elements selected from the group consisting of Fe, Co, Mg, Si, Ni, Cr, Zr, Mo, V, Nb, Mn, B, and P as a third element, with the balance being copper and unavoidable impurities, wherein a coefficient of variation in a Ti concentration fluctuation curve is 0.2 to 0.8, the Ti concentration fluctuation curve being obtained when Ti in a matrix phase for -oriented crystal grains in a cross section parallel to a rolling direction is subjected to line analysis by EDX, and in structure observation of a cross section parallel to the rolling direction, a number of second-phase particles having a size of 3 µm or more per an observation field of view of 10000 µm 2 is 35 or less.