TRANSPARENT GAS BARRIER FILM AND METHOD FOR MANUFACTURING TRANSPARENT GAS BARRIER FILM

Disclosed are a transparent gas barrier film, and a manufacturing method of the same. According to an aspect of the present invention, the transparent gas barrier film comprises: a base substrate; first and second barrier layers composed of an inorganic layer which is positioned on an upper part of...

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Bibliographic Details
Main Authors KIM, KYUNG KAK, KIM, TAE HYUN, SHIN, CHUNG HWAN
Format Patent
LanguageEnglish
Korean
Published 08.07.2016
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Summary:Disclosed are a transparent gas barrier film, and a manufacturing method of the same. According to an aspect of the present invention, the transparent gas barrier film comprises: a base substrate; first and second barrier layers composed of an inorganic layer which is positioned on an upper part of the base substrate while acting as a barrier layer; and a passivation layer positioned between the first and second barrier layers. The passivation layer is composed of reduced graphene oxide (RGO). 본 발명은 투명 가스 배리어성 필름 및 이를 제조하는 방법을 개시한다. 본 발명의 일 측면에 따른 투명 가스 배리어성 필름은, 베이스 기재; 상기 베이스 기재의 상부에 위치하여 배리어층 역할을 하는 무기막으로 이루어진 제 1, 2 배리어층; 및 상기 제 1, 2 배리어층의 사이에 위치하는 패시베이션층;을 포함하고, 상기 패시베이션층은 환원 그래핀 산화물(RGO)로 이루어진다.
Bibliography:Application Number: KR20140195430