METHOD FOR SUPPLYING CHEMICAL AND APPARATUS FOR TREATING SUBSTRATE

The present invention provides a method for supplying a processing liquid and a device thereof. In the method for supplying a processing liquid to a substrate, a first chemical and pure water are mixed to generate processing liquid, the pure water is supplied in a heated state before the pure water...

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Bibliographic Details
Main Authors JUNG, YOUNG HUN, CHO, SOO HYUN, SEO, KYUNG JIN, YOO, HYE JEONG
Format Patent
LanguageEnglish
Korean
Published 05.07.2016
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The present invention provides a method for supplying a processing liquid and a device thereof. In the method for supplying a processing liquid to a substrate, a first chemical and pure water are mixed to generate processing liquid, the pure water is supplied in a heated state before the pure water is mixed with the first chemical, and the concentration and the temperature of the processing liquid are adjusted by the amount of heated pure water. Therefore, a throughput of a development process can be improved, and the amount of using the processing liquid can be reduced. 본 발명은 처리액을 공급하는 방법 및 장치를 제공한다. 기판에 처리액을 공급하는 방법으로는, 제1케미칼과 순수를 혼합하여 상기 처리액을 생성하되, 상기 순수는 상기 제1케미칼과 혼합 전에 가열된 상태로 공급되고, 가열된 상기 순수의 양에 의해 상기 처리액의 농도 및 온도가 조절된다. 이에 따라 현상 공정의 쓰루풋을 향상시키고, 처리액의 사용량을 줄일 수 있다.
Bibliography:Application Number: KR20140187980