LIQUID METAL BASED RECONFIGURABLE PHOTOMASK AND METHOD FOR MANUFACTURING THE SAME

The present invention relates to a microfluidic-based reconfigurable photomask and a method of manufacturing the same. The microfluidic-based reconfigurable photomask comprises: a transparent substrate forming a hollow; microfluid filling the hollow; and a variable character varying the microfluid....

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Bibliographic Details
Main Authors RYOO, KWANG KI, LEE, JEONG BONG
Format Patent
LanguageEnglish
Korean
Published 04.07.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The present invention relates to a microfluidic-based reconfigurable photomask and a method of manufacturing the same. The microfluidic-based reconfigurable photomask comprises: a transparent substrate forming a hollow; microfluid filling the hollow; and a variable character varying the microfluid. According to the present invention, a variety of photomasks can be used as a pattern can be varied. 본 발명은 마이크로 유체 기반 가변 포토마스크 및 이의 제조방법에 관한 것으로서, 중공을 형성시킨 투광성기판과, 중공에 충진된 마이크로 유체와, 마이크로 유체를 가변시키는 가변자를 포함한다. 본 발명에 따르면, 패턴을 가변시킬 수 있으므로 다양한 포토마스크로의 이용이 가능하다.
Bibliography:Application Number: KR20140188670