BIPOLAR COLLIMATOR UTILIZED IN A PHYSICAL VAPOR DEPOSITION CHAMBER

• Main Authors: LIU GUOJUN, WANG WEI W, LEE JOUNG JOO, KOTHNUR PRASHANTH
• Format: Patent
• Language: English; Korean
• Published: 28.06.2016
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

본 발명은, 물리 기상 증착 챔버에 배치된 바이폴라 콜리메이터를 포함하는 장치, 및 그러한 장치를 사용하는 방법들을 제공한다. 일 실시예에서, 장치는, 내부에 프로세싱 구역을 정의하는, 챔버 바디 및 그러한 챔버 바디 상에 배치된 챔버 덮개, 프로세싱 구역에 배치된 콜리메이터, 및 콜리메이터에 커플링된 전력 소스를 포함한다. The present invention provides an apparatus including a bipolar collimator disposed in a physical vapor deposition chamber and methods of using the same. In one embodiment, an apparatus includes a chamber body and a chamber lid disposed on the chamber body defining a processing region therein, a collimator disposed in the processing region, and a power source coupled to the collimator.