RINSE SOLUTION FOR SILICA THIN FILM, METHOD OF PRODUCING SILICA THIN FILM, AND SILICA THIN FILM

Provided is a rinse solution for silica thin films, which comprises: trimethylbenzene, diethylbenzene, indane, indene, tert-butyl toluene, methylnaphthalene, a mixture containing an aromatic hydrocarbon having 12 or more carbon atoms, a mixture containing an aliphatic hydrocarbon having 12 or more c...

Full description

Saved in:
Bibliographic Details
Main Authors LEE, HAN SONG, KIM, HA NEUL, JUNG, IL, KOH, SANG RAN, YUN, HUI CHAN, LIM, WAN HEE, KIM, WOO HAN
Format Patent
LanguageEnglish
Korean
Published 24.06.2016
Subjects
ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
BASIC ELECTRIC ELEMENTS
CANDLES
CHEMISTRY
DETERGENT COMPOSITIONS
DETERGENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FATTY ACIDS THEREFROM
METALLURGY
RECOVERY OF GLYCEROL
RESIN SOAPS
SEMICONDUCTOR DEVICES
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
Online AccessGet full text

Cover

More Information
Summary:Provided is a rinse solution for silica thin films, which comprises: trimethylbenzene, diethylbenzene, indane, indene, tert-butyl toluene, methylnaphthalene, a mixture containing an aromatic hydrocarbon having 12 or more carbon atoms, a mixture containing an aliphatic hydrocarbon having 12 or more carbon atoms, a mixture containing a heterohydrocarbon compound having a phenyl group or an oxygen atom, or a combination thereof. The rinse solution for silica thin films is capable of sharply delaminating boundary areas of silica thin films. 트리메틸 벤젠(trimethylbenzene), 디에틸벤젠(diethylbenzene), 인단(indane), 인덴(indene), 터셔리 부틸 톨루엔(tert-butyl toluene), 메틸나프탈렌(methylnaphthalene), 탄소수 12 이상인 방향족 탄화수소 함유 혼합물, 탄소수 12 이상인 지방족 탄화수소 함유 혼합물, 페닐기 및 산소원자를 포함하는 헤테로 탄화수소 화합물을 함유하는 혼합물, 또는 이들의 조합을 포함하는 실리카 박막용 린스액을 제공한다.
Bibliography:Application Number: KR20150079441