CLEANING COMPOSITION FOR REMOVING SILICON BASED SCALE

Provided are an acidic cleaning composition which is an aqueous solution having pH of 3.5 to 6.5 for removing silicon-based scale; and a neutral cleaning composition having pH of 6.5 to 8.5 for removing silicon-based scale. The aqueous solution comprises at least one selected between a fluorosilicon...

Full description

Saved in:
Bibliographic Details
Main Author CHOI, SANG KYO
Format Patent
LanguageEnglish
Korean
Published 22.06.2016
Subjects
ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
CANDLES
CHEMISTRY
DETERGENT COMPOSITIONS
DETERGENTS
FATTY ACIDS THEREFROM
METALLURGY
RECOVERY OF GLYCEROL
RESIN SOAPS
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
Online AccessGet full text

Cover

More Information
Summary:Provided are an acidic cleaning composition which is an aqueous solution having pH of 3.5 to 6.5 for removing silicon-based scale; and a neutral cleaning composition having pH of 6.5 to 8.5 for removing silicon-based scale. The aqueous solution comprises at least one selected between a fluorosilicon compound and ammonium bifluoride (NH_4HF_2). The cleaning solution can remove silicon-based scale, hardness component scale, metal component scale, etc., at the same time, thereby having a simple process without having a separate alkali cleaning process while having excellent effect of cleaning. 본 발명은 불화규소화합물 및 중불화암모늄(NHF.HF)에서 선택된 하나 이상을 포함하는 수용액이며, pH가 3.5 내지 6.5인 실리콘계 스케일 제거용 산성 세정액 조성물 및 pH가 6.5 내지 8.5인 실리콘계 스케일 제거용 중성 세정액 조성물을 제공하며, 이러한 세정액으로 실리콘계 스케일과 함께 경도 성분 스케일 및 금속 성분 스케일 등을 동시에 제거하여, 별도의 알칼리 세정 공정을 거치지 않아 공정이 간단하고, 세정효과도 우수한 효과가 있다.
Bibliography:Application Number: KR20140178725