LAMINATED BODY, ORGANIC SEMICONDUCTOR MANUFACTURING KIT AND ORGANIC SEMICONDUCTOR MANUFACTURING RESIST COMPOSITION

• Main Authors: KAMOCHI YOSHITAKA, IWAI YU, KOYAMA ICHIRO, MIZUTANI KAZUYOSHI
• Format: Patent
• Language: English; Korean
• Published: 01.06.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TRANSPORTING

본 발명은, 양호한 유기 반도체 패턴을 형성 가능한 적층체, 및 이러한 적층체를 제조하기 위한, 유기 반도체 제조용 키트, 그리고 유기 반도체 제조용 키트에 이용하는 유기 반도체 제조용 레지스트 조성물을 제공하는 것을 목적으로 한다. 유기 반도체막과, 상기 유기 반도체막 상의 보호막과, 상기 보호막 상의 레지스트막을 갖고, 상기 레지스트막이, 광라디칼 중합 개시제 (A) 및 라디칼 중합성 화합물 (B)를 포함하는 감광성 수지 조성물로 이루어지는 적층체이다. The purpose of the present invention is to provide the following: a laminated body capable of forming an excellent organic semiconductor pattern; an organic semiconductor manufacturing kit for manufacturing such a laminated body; and an organic semiconductor manufacturing resist composition for use in such a kit. The laminated body has an organic semiconductor film, a protective film on top of the organic semiconductor film, and a resist film on top of the protective film. The resist film includes a photosensitive resin composition that includes a photo-radical polymerization initiator (A) and a radical polymerizable composition (B).