METHODS OF MANUFACTURING A GRAPHITE LAYER

• Main Authors: KIM, BYUNG GOOK, KIM, MUN JA, CHOI, JAE HYUCK
• Format: Patent
• Language: English; Korean
• Published: 23.05.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

Described is a method for manufacturing a pellicle having a graphite layer, which includes: preparing a substrate; forming a membrane by performing a CVD process on the substrate; separating the membrane from the substrate in a first solvent; rinsing the separated membrane in a second solvent; and transferring the separated membrane onto a frame in a third solvent. So, the pellicle for an extremely ultra violet light photolithography process can be provided. 기판을 준비하고, 상기 기판 상에 CVD 공정을 수행하여 멤브레인을 형성하고, 제1 용매 내에서 상기 기판 상으로부터 상기 멤브레인을 분리하고, 제2 용매 내에서 상기 분리된 멤브레인을 린스하고, 및 제3 용매 내에서 상기 분리된 멤브레인을 프레임 상으로 전사하는 것을 포함하는 펠리클 제조 방법이 설명된다.