THIN FILM DEPOSITION APPARATUS HAVING AUXILIARY SENSORS FOR MEASURING THICKNESS

The present invention relates to a thin film deposition apparatus including a chamber which accommodates a substrate and through which the substrate is loaded and unloaded, and an evaporating unit which is installed at the bottom of the chamber and evaporates and deposits a deposition material onto...

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Bibliographic Details
Main Authors KIM, JUN SEUNG, PARK, YEONG SHIN, LEE, SOON CHUL
Format Patent
LanguageEnglish
Korean
Published 18.05.2016
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The present invention relates to a thin film deposition apparatus including a chamber which accommodates a substrate and through which the substrate is loaded and unloaded, and an evaporating unit which is installed at the bottom of the chamber and evaporates and deposits a deposition material onto the substrate. The thin film deposition apparatus includes: a main sensor which is disposed between the evaporating unit and the substrate, and measures the evaporation quantity of the deposition material evaporated by the evaporating unit; and an auxiliary sensor which is disposed flush with the surface of the substrate, and measures the thickness of the deposition material deposited on the surface of the substrate, whereby a uniform thin film can be formed by accurately measuring the thickness of a thin film while the thin film is being formed. 본 발명은 박막 증착 장치에 관한 것으로서, 기판을 인입 및 인출할 수 있게 수용하는 챔버와, 상기 챔버 하부에 설치되고 증착 물질을 증발시켜 상기 기판에 증착시키는 증발 유닛을 포함하는 이루어지며, 상기 증발 유닛과 상기 기판 사이에 배치되어, 상기 증발 유닛으로부터 증발하는 증착 물질의 증발량을 측정하는 기본 센서와, 상기 기판의 표면과 동일한 위치에 배치되어, 상기 기판의 표면에 증착되는 증착 물질의 두께를 측정하는 보조 센서를 포함함으로써, 성막 중에 박막의 두께를 정확하게 측정하여 균일한 박막을 형성할 수 있다.
Bibliography:Application Number: KR20140155250