CHEMICALLY-AMPLIFIED POSITIVE TYPE PHOTO-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE

• Main Authors: HIKITA MASANORI, YAMAZAKI KENTA, SHIMOYAMA TATSUYA, KASHIWAGI DAISUKE
• Format: Patent
• Language: English; Korean
• Published: 22.04.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

감도가 높고, 치수 안정성이 우수하고, 밀착성이 우수하고, 또한 가열 후에도 높은 투과율을 유지하는 것이 가능한 감광성 수지 조성물의 제공. (A) 하기 (1) 및 (2) 중 적어도 한쪽을 만족시키는 중합체를 포함하는 중합체 성분, (1) (a1) 산기가 산 분해성 기로 보호된 기를 갖는 구성 단위 및 (a2) 가교성 기를 갖는 구성 단위를 갖는 중합체, (2) (a1) 산기가 산 분해성 기로 보호된 기를 갖는 구성 단위를 갖는 중합체 및 (a2) 가교성 기를 갖는 구성 단위를 갖는 중합체, (S) 하기 일반식(S)으로 나타내어지는 화합물(일반식(S) 중, R, R및 R은 각각 치환기이며, R, R및 R중 적어도 1개는 하기 (S-1)을 만족시키는 치환기이다), (S-1) (A) 중합체 성분과 일반식(S)으로 나타내어지는 화합물 사이에서, 또는 일반식(S)으로 나타내어지는 화합물끼리의 사이에서 산 및/또는 150℃ 이상의 가열에 의해 가교할 수 있는 관능기를 갖는 치환기이다. (B) 광산 발생제 및 (D) 용제를 함유하는 화학 증폭형 포지티브형 감광성 수지 조성물. Provided is a photosensitive resin composition having high sensitivity, excellent dimensional stability, and excellent adhesiveness, the photosensitive resin composition being capable of retaining high transmittance even after heating. A chemically amplified positive photosensitive resin composition having: (A) a polymer component containing a polymer that satisfies (1) and/or (2) below, (S) a compound expressed by general formula (S) (in general formula (S), R1, R2, and R3 are substituent groups, and at least one of R1, R2, and R3 is a substituent group that satisfies (S-1) below), (B) a photo-acid-generating agent, and (D) a solvent. (1) is a polymer having (a1) a structural unit that has groups in which an acid group is protected by an acidolytic group, and (a2) a structural unit that has a cross-linking group; (2) is a polymer having (a1) a structural unit that has units in which an acid group is protected by an acidolytic group, and (a2) a polymer having a structural unit that has a cross-linking group; (S-1) is a substituent group having a functional group capable of cross-linking between the polymer component (A) and the compound expressed by general formula (S), or between two compounds expressed by general formula (S), the cross-linking being achieved using an acid and/or heating at no less than 150°C.