VARIABLE CONDUCTANCE GAS DISTRIBUTION APPARATUS AND METHOD

Disclosed are a variable conductance gas distribution system, a reactor and a system, which include the variable conductance gas distribution system, and a method for using the variable conductance gas distribution system, the reactor, and the system. According to the variable conductance gas distri...

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Bibliographic Details
Main Author SHUGRUE JOHN KEVIN
Format Patent
LanguageEnglish
Korean
Published 18.04.2016
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Disclosed are a variable conductance gas distribution system, a reactor and a system, which include the variable conductance gas distribution system, and a method for using the variable conductance gas distribution system, the reactor, and the system. According to the variable conductance gas distribution system, gas-flow conductance is able to be swiftly controlled by the gas distribution system. 가변 컨덕턴스 가스 분배 시스템, 그 가변 컨덕턴스 가스 분배 시스템을 포함하는 반응기 및 시스템, 그리고 가변 컨덕턴스 가스 분배 시스템, 반응기 및 시스템을 이용하는 방법이 개시된다. 가변 컨덕턴스 가스 분배 시스템은 가스 분배 시스템을 통해 가스 흐름 컨덕턴스의 빠른 조작을 가능하게 한다.
Bibliography:Application Number: KR20150140332