FILM-FORMING COMPOSITION, FILM FORMED THEREBY, AND METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT USING SAME

• Main Authors: TERUI YOSHIHARU, KOMORIYA HARUHIKO, HARA YUKARI, KOBAYASHI FUMITO, HARA IKUNARI
• Format: Patent
• Language: English; Korean
• Published: 23.03.2016
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; CORRECTING FLUIDS; DYES; ELECTRICITY; FILLING PASTES; INKS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; USE OF MATERIALS THEREFOR; WOODSTAINS

본 발명의 막 형성용 조성물은, 일반식 (1)로 나타나는 반복 단위를 포함하는 불소 수지와, 불소계 용제를 포함한다. [화학식 43](R은, 각각 독립적으로, 수소 원자, 불소 원자, 메틸기 또는 트리플루오로메틸기이다. R는, 각각 독립적으로, 탄소수 1∼15의 직쇄상, 탄소수 3∼15의 분기쇄상 또는 탄소수 3∼15의 환상의 함불소 탄화수소기이고, 탄화수소기 중의 수소 원자가 불소 원자로 치환되어 있어도 되고, 반복 단위 중에 적어도 1개의 불소 원자를 포함한다.) 당해 조성물은, 유기 반도체막 상에 막의 형성이 가능하고, 포토리소그래피 등에 있어서 유기 반도체의 정치(精緻)한 패턴을 얻을 때에, 에칭 용제에 내성이 있어, 유기 반도체 소자의 제조 방법에 유용하다. A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the general formula (1); and a fluorine-containing solvent. In the general formula (1), R1 each independently represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; and R2 each independently represents a C1-C15 straight, C3-C15 branched or C3-C15 cyclic fluorine-containing hydrocarbon group in which any hydrogen atom may be replaced by a fluorine atom with the proviso that the repeating unit contains at least one fluorine atom; and This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element because the composition can form a film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.