SEPARATION OF HEAT AND LIGHT FOR A UV RADIATION SOURCE

• Main Author: ZUGER OTHMAR
• Format: Patent
• Language: English; Korean
• Published: 15.03.2016
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BLASTING; DRYING; DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM; HEATING; LIGHTING; MECHANICAL ENGINEERING; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PERFORMING OPERATIONS; PHYSICS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING; WEAPONS

본 발명은 적용 영역 내의 기판들에 UV 방사선을 적용시키는 장치에 관한 것으로, 장치는 공간각으로 UV 방사선, 가시광선 및 적외선 방사선을 발광하는 방사선원; UV 방사선의 대부분을 반사하고 VIS 및 IR 방사선의 대부분을 송신하는 방사선-선택 편향 거울을 포함하고, 편향 거울은 서로에 대하여 기울어진 적어도 두 개의 평면 거울 스트립들을 포함하는 것을 특징으로 한다. A device for applying UV radiation to substrates in a field of application. The device includes: a radiation source, which emits both UV radiation and visible light and infrared radiation in a spatial angle; and a radiation-selective deflecting mirror, which mostly reflects the UV radiation and mostly transmits the VIS and IR radiation. The deflecting mirror includes at least two flat mirror strips, which are tilted with respect to each other.