EMBOSSING COMPOUND FOR EMBOSSING LITHOGRAPHY

• Main Author: CHOUIKI MUSTAPHA
• Format: Patent
• Language: English; Korean
• Published: 29.02.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TRANSPORTING

본 발명은 적어도 하나의 중합 가능 주성분 및 적어도 하나의 부성분의 혼합물로 이루어지는, 엠보싱 리소그래피에 사용될 수 있는 경화성 엠보싱 재료에 관한 것이다. 추가로, 본 발명은 엠보싱 형태(4, 4', 4'', 4''', 4)의 일차 형성에 대한 전술한 청구항 중 어느 한 항에 따른 엠보싱 재료의 용도에 관한 것이다. An embossing material that can be hardened and used for embossing lithography, comprised of a mixture of at least one polymerizable main component, and at least one secondary component. The invention also relates to a use of the embossing material for the primary forming of an embossing form.