SEMICONDUCTOR DEVICE
The preset invention is to reduce the resistance of a conductor formed in a wiring layer. An insulating layer (ETS1) is formed on a substrate (SUB), and includes SiO_(1-x)N_x, wherein x > 0.5 is satisfied in an analysis result of XRD. A wiring (INC1) is formed on the insulating layer (ETS1), and...
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Main Authors | , , , , , |
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Format | Patent |
Language | English Korean |
Published |
17.02.2016
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Subjects | |
Online Access | Get full text |
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