NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING PHOTOREACTIVE SILANE COUPLING AGENT

• Main Authors: YOUN, HYOC MIN, JEONG, JONG HO, HAN, SEUNG JIN, LEE, JA YOUNG, YUN, JOO PYO, PARK, JU YEOUNG
• Format: Patent
• Language: English; Korean
• Published: 29.12.2015
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The present invention relates to a negative photosensitive resin composition and, more specifically, to a negative photosensitive resin composition comprising a photoreactive silane coupling agent including a vinyl or an acrylic group. The composition of the present invention not only ensures developing adhesive properties, but also has superior prebake margin and hole pattern properties by comprising the photoreactive silane coupling agent so that the composition is suitable to be used in a large area display which uses an insulating film. 본 발명은 네거티브 감광성 수지 조성물에 관한 것으로, 더욱 상세하게는 비닐 또는 아크릴기를 포함하는 광반응성 실란 커플링제를 포함하는 네거티브 감광성 수지 조성물에 관한 것이다. 본 발명의 조성물은 상기 광반응성 실란 커플링제를 포함함으로써 현상 접착성을 확보하면서도 프리베이크 마진 및 홀 패턴 특성이 우수하므로, 절연막을 사용하는 대면적 디스플레이에 사용하기 적합하다.