MEASURING SYSTEM AND MEASURING METHOD

• Main Authors: PARK, SANG HYUN, PARK, SANG WOOK, JANG, SANG DON, SON, TAE KYU
• Format: Patent
• Language: English; Korean
• Published: 03.12.2015
• Subjects: ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR; PHYSICS; TARIFF METERING APPARATUS; TESTING

The present invention relates to a measuring system and a measuring method. According to an embodiment of the present invention, the measuring system includes: a first reference member located on one of a first target member and a second target member; the first and second target members configured to make a relative movement with respect to each other, and the first reference member having a first length; a second reference member located on an other of the first target member and the second target member having a second length; and a measuring unit located on a distance from the first reference member and the second reference member, the measuring unit configured to measure a relative location of one of the first reference member and the second reference member with respect to the other may be provided. 본 발명은 계측 시스템 및 계측 방법에 관한 것이다. 본 발명의 일 실시 예에 따른 계측 시스템은 서로 상대적으로 이동 가능하게 제공되는 제 1 대상 부재 및 제 2 대상 부재 가운데 하나에 위치되고, 제 1 길이를 갖는 제 1 기준 부재; 상기 제 1 대상 부재 및 상기 제 2 대상 부재 가운데 나머지 하나에 위치되고, 제 2 길이를 갖는 제 2 기준 부재; 및 상기 제 1 기준 부재 및 상기 제 2 기준 부재와 이격되게 위치되어, 상기 제 1 기준 부재와 상기 제 2 기준 부재 가운데 하나를 기준으로 다른 하나의 상대적 위치를 계측하는 계측 유닛을 포함한다.