ILLUMINATION OPTICAL UNIT FOR A MASK INSPECTION SYSTEM AND MASK INSPECTION SYSTEM WITH SUCH AN ILLUMINATION OPTICAL UNIT

• Main Authors: KORB THOMAS, DEGUNTHER MARKUS
• Format: Patent
• Language: English; Korean
• Published: 24.11.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BLASTING; CINEMATOGRAPHY; ELECTROGRAPHY; FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMSTHEREOF; GAMMA RAY OR X-RAY MICROSCOPES; HEATING; HOLOGRAPHY; INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21Sand F21V, RELATING TO USESOR APPLICATIONS OF LIGHTING DEVICES OR SYSTEMS; IRRADIATION DEVICES; LIGHTING; MATERIALS THEREFOR; MECHANICAL ENGINEERING; NON-PORTABLE LIGHTING DEVICES; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHERARTICLES, NOT OTHERWISE PROVIDED FOR; SYSTEMS THEREOF; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLEEXTERIORS; WEAPONS

마스크 검사 시스템용 조명 광학 유닛(1)이 EUV 조명 광(2)과 사용된다. 조명 광학 유닛(1)의 중공의 웨이브가이드(9)가 조명 광(2)을 안내하는 역할을 한다. 중공의 웨이브가이드(9)가 조명 광(2)용 입구(7) 및 조명 광(2)용 출구(10)를 갖는다. 중공의 웨이브가이드(9)의 하류에 배치되는 이미징 미러 광학 유닛(11)이, 출구(10)를 조명 필드(4)내로 이미징하는 역할을 한다. 이것은, 조명 광학 유닛의 쓰루풋이 EUV 조명 광에 대해 최적화되는 결과를 가져온다. An illumination optical unit for a mask inspection system is used with EUV illumination light. A hollow waveguide of the illumination optical unit serves for guiding the illumination light. The hollow waveguide has an entry opening for the illumination light and an exit opening for the illumination light. An imaging mirror optical unit, arranged downstream of the hollow waveguide serves to image the exit opening into an illumination field. This results in an illumination optical unit, the throughput of which is optimized for the EUV illumination light.