PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND

• Main Authors: SHIBUYA AKINORI, FURUTANI HAJIME, FUKUHARA TOSHIAKI, SHIRAKAWA MICHIHIRO, KATAOKA SHOHEI
• Format: Patent
• Language: English; Korean
• Published: 07.10.2015
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; HETEROCYCLIC COMPOUNDS; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

본 발명은 (i) (A) 특정 일반식(I-1)으로 나타내어지는 화합물, (B) 화합물(A)과 다르며, 활성광선 또는 방사선의 조사시에 산을 발생할 수 있는 화합물, 및 (P) 화합물(A)로부터 발생한 산과 반응하지 않으며, 화합물(B)로부터 발생한 산의 작용에 의해 유기 용제 함유 현상액에 대한 용해도를 감소시킬 수 있는 수지를 함유하는 감활성광선성 또는 감방사선성 수지 조성물을 함유하는 막을 형성하는 공정, (ii) 상기 막을 노광하는 공정, 및 (iii) 유기 용제 함유 현상액을 사용하여 상기 노광된 막을 현상하여 네가티브 패턴을 형성하는 공정을 포함하는 패턴 형성 방법; 상기 감활성광선성 감방사선성 수지 조성물; 상기 조성물을 사용한 레지스트막을 제공한다. There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.