DEPOSITION SYSTEM
A deposition system comprises: a plurality of process chamber groups arranged in a first direction; a carrier to transmit the process chamber groups; at least one gate valve disposed between the process chamber groups to supply a transmitting path of the carrier between the process chamber groups; a...
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Main Authors | , , |
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Format | Patent |
Language | English Korean |
Published |
28.08.2015
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Subjects | |
Online Access | Get full text |
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Abstract | A deposition system comprises: a plurality of process chamber groups arranged in a first direction; a carrier to transmit the process chamber groups; at least one gate valve disposed between the process chamber groups to supply a transmitting path of the carrier between the process chamber groups; a substrate which is attached to the carrier, and on which a deposition material is deposited; and a plurality of attractive levitation modules disposed to face the carrier inside the process chamber groups to transmit the carrier with an electromagnetic force. A sum total of the electromagnetic force of the attractive levitation modules overlapped with the carrier when a predetermined area of the carrier overlaps with a discontinuous section defined as an area in which a gate valve is disposed, is set more largely than a sum total of the electromagnetic force of the attractive levitation modules overlapped with the carrier when the carrier is disposed inside each of the process chamber groups. |
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AbstractList | A deposition system comprises: a plurality of process chamber groups arranged in a first direction; a carrier to transmit the process chamber groups; at least one gate valve disposed between the process chamber groups to supply a transmitting path of the carrier between the process chamber groups; a substrate which is attached to the carrier, and on which a deposition material is deposited; and a plurality of attractive levitation modules disposed to face the carrier inside the process chamber groups to transmit the carrier with an electromagnetic force. A sum total of the electromagnetic force of the attractive levitation modules overlapped with the carrier when a predetermined area of the carrier overlaps with a discontinuous section defined as an area in which a gate valve is disposed, is set more largely than a sum total of the electromagnetic force of the attractive levitation modules overlapped with the carrier when the carrier is disposed inside each of the process chamber groups. |
Author | CHOI, YOUNG MOOK KIM, CHAE WOONG HONG, JONG WON |
Author_xml | – fullname: HONG, JONG WON – fullname: KIM, CHAE WOONG – fullname: CHOI, YOUNG MOOK |
BookMark | eNrjYmDJy89L5WQQdHEN8A_2DPH091MIjgwOcfXlYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx3kFGBoamBgaWFkbm5o7GxKkCAHO4IKc |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences |
ExternalDocumentID | KR20150098277A |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_KR20150098277A3 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 14:46:08 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English Korean |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_KR20150098277A3 |
Notes | Application Number: KR20140019153 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150828&DB=EPODOC&CC=KR&NR=20150098277A |
ParticipantIDs | epo_espacenet_KR20150098277A |
PublicationCentury | 2000 |
PublicationDate | 20150828 |
PublicationDateYYYYMMDD | 2015-08-28 |
PublicationDate_xml | – month: 08 year: 2015 text: 20150828 day: 28 |
PublicationDecade | 2010 |
PublicationYear | 2015 |
RelatedCompanies | SAMSUNG DISPLAY CO., LTD |
RelatedCompanies_xml | – name: SAMSUNG DISPLAY CO., LTD |
Score | 2.978732 |
Snippet | A deposition system comprises: a plurality of process chamber groups arranged in a first direction; a carrier to transmit the process chamber groups; at least... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
Title | DEPOSITION SYSTEM |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150828&DB=EPODOC&locale=&CC=KR&NR=20150098277A |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQAdYpSUnJlkm65qamRromickGuokpBua6RokWicAEBuxkgHe9-_qZeYSaeEWYRjAx5MD2woDPCS0HH44IzFHJwPxeAi6vCxCDWC7gtZXF-kmZQKF8e7cQWxc1aO8YdLi5kYWai5Ota4C_i7-zmrOzrXeQml8QRM7A0sLI3NyRmYEV1JAGnbTvGuYE2pdSgFypuAkysAUAzcsrEWJgys4XZuB0ht29JszA4Qud8gYyobmvWIRB0AVoX7AnaFBJITgyOMTVV5RB2c01xNlDF2h2PNwr8d5ByA4xFmNgAXbyUyUYFIC1BLDtYWqaaJFmbGKeZJ4EOoYe2FaxTElNsjRINJVkkMFnkhR-aWkGLhAXNBZqZCHDwFJSVJoqC6xMS5LkwGEAAMCoc30 |
link.rule.ids | 230,309,786,891,25594,76903 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQAdYpSUnJlkm65qamRromickGuokpBua6RokWicAEBuxkgHe9-_qZeYSaeEWYRjAx5MD2woDPCS0HH44IzFHJwPxeAi6vCxCDWC7gtZXF-kmZQKF8e7cQWxc1aO8YdLi5kYWai5Ota4C_i7-zmrOzrXeQml8QRM7A0sLI3NyRmYHVHNgpBHeWwpxA-1IKkCsVN0EGtgCgeXklQgxM2fnCDJzOsLvXhBk4fKFT3kAmNPcVizAIugDtC_YEDSopBEcGh7j6ijIou7mGOHvoAs2Oh3sl3jsI2SHGYgwswE5-qgSDArCWALY9TE0TLdKMTcyTzJNAx9AD2yqWKalJlgaJppIMMvhMksIvLc_A6RHi6xPv4-nnLc3ABZICjYsaWcgwsJQUlabKAivWkiQ5cHgAAEtCdmc |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=DEPOSITION+SYSTEM&rft.inventor=HONG%2C+JONG+WON&rft.inventor=KIM%2C+CHAE+WOONG&rft.inventor=CHOI%2C+YOUNG+MOOK&rft.date=2015-08-28&rft.externalDBID=A&rft.externalDocID=KR20150098277A |