DEPOSITION SYSTEM
A deposition system comprises: a plurality of process chamber groups arranged in a first direction; a carrier to transmit the process chamber groups; at least one gate valve disposed between the process chamber groups to supply a transmitting path of the carrier between the process chamber groups; a...
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Main Authors | , , |
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Format | Patent |
Language | English Korean |
Published |
28.08.2015
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Subjects | |
Online Access | Get full text |
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Summary: | A deposition system comprises: a plurality of process chamber groups arranged in a first direction; a carrier to transmit the process chamber groups; at least one gate valve disposed between the process chamber groups to supply a transmitting path of the carrier between the process chamber groups; a substrate which is attached to the carrier, and on which a deposition material is deposited; and a plurality of attractive levitation modules disposed to face the carrier inside the process chamber groups to transmit the carrier with an electromagnetic force. A sum total of the electromagnetic force of the attractive levitation modules overlapped with the carrier when a predetermined area of the carrier overlaps with a discontinuous section defined as an area in which a gate valve is disposed, is set more largely than a sum total of the electromagnetic force of the attractive levitation modules overlapped with the carrier when the carrier is disposed inside each of the process chamber groups. |
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Bibliography: | Application Number: KR20140019153 |