METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING LAYERS

Provided is a method for manufacturing a polishing layer for polishing a substrate, which comprises the steps of: providing a liquid prepolymer; providing multiple hollow microspheres; forming multiple exposed hollow microspheres by treating the multiple exposed hollow microspheres with a carbon dio...

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Bibliographic Details
Main Authors SARAFINAS AARON, SAIKIN ALAN, MCCLAIN GEORGE, POST ROBERT L, KOLESAR DAVID
Format Patent
LanguageEnglish
Korean
Published 27.08.2015
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Summary:Provided is a method for manufacturing a polishing layer for polishing a substrate, which comprises the steps of: providing a liquid prepolymer; providing multiple hollow microspheres; forming multiple exposed hollow microspheres by treating the multiple exposed hollow microspheres with a carbon dioxide condition; forming a curable mixture by assembling the liquid prepolymer with multiple treated hollow microspheres; forming a cured material by making a reaction of the liquid mixture, wherein the reaction starts within 24 hours or less after formation of the multiple treated hollow microspheres; and inducing one or more polishing layer from the cured material, wherein one or more polishing layer has a polishing surface optimized for polishing a substrate.
Bibliography:Application Number: KR20150022383