CONDUCTIVE SUPPORT FOR AN OLED DEVICE AND AN OLED DEVICE INCORPORATING SAME
A conductive support for an OLED, includes a dielectric sublayer, with an optical thickness L1 of greater than 20 nm and less than 180 nm, including a first crystalline contact layer based on zinc oxide, a first silver layer of less than 20 nm, a dielectric separating layer, with an optical thicknes...
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Main Authors | , |
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Format | Patent |
Language | English Korean |
Published |
26.08.2015
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Subjects | |
Online Access | Get full text |
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Summary: | A conductive support for an OLED, includes a dielectric sublayer, with an optical thickness L1 of greater than 20 nm and less than 180 nm, including a first crystalline contact layer based on zinc oxide, a first silver layer of less than 20 nm, a dielectric separating layer, with an optical thickness L2 of greater than 80 nm and less than 280 nm, including in this order a layer of zinc oxide with a thickness e2, directly on the first silver layer, an optional amorphous layer, based on tin zinc or indium zinc or indium zinc tin oxide with a thickness ei of less than 15 nm, a second layer of zinc oxide, with a thickness ec2, the sum of ec2+e2 being at least 30 nm, a second silver layer of less than 20 nm, a metal overblocker of less than 3 nm, a dielectric electrically conductive overlayer. |
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Bibliography: | Application Number: KR20157018305 |