STRUCTURE AND METHOD FOR FORMING PATTERN USING BLOCK COPOLYMER MATERIALS

A structure for forming patterns using block copolymers includes a first block copolymer layer arranged on a first region in a substrate, and a second block copolymer layer arranged on the first block copolymer layer in the first region, and on a second region in the substrate.

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Bibliographic Details
Main Authors BOK, CHEOL KYU, KIM, MYOUNG SOO, BAN, KEUN DO
Format Patent
LanguageEnglish
Korean
Published 20.08.2015
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A structure for forming patterns using block copolymers includes a first block copolymer layer arranged on a first region in a substrate, and a second block copolymer layer arranged on the first block copolymer layer in the first region, and on a second region in the substrate.
Bibliography:Application Number: KR20140014899