METHOD OF MANUFACTURING MEMS DEVICE AND MEMS DEVICE MANUFACTURED BY USING THE SAME

• Main Authors: JANG, SUNG TAEK, PARK, BYUNG IL, KIM, SHEUNG KI, PARK, CHUN BONG
• Format: Patent
• Language: English; Korean
• Published: 17.08.2015
• Subjects: INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT; MEASURING; MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK; MICROSTRUCTURAL TECHNOLOGY; PERFORMING OPERATIONS; PHYSICS; PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS; TESTING; TRANSPORTING

The present invention relates to a MEMS device manufacturing method and a MEMS device manufactured using the method, comprising the steps of: performing oxide deposition and mask process on an upper portion of a silicon substrate, etching, and removing a photoresist, to form an oxide pattern; depositing a sacrificial substance on the upper portion of the silicon substrate on which the oxide pattern is formed, and depositing polysilicon on the upper portion of the sacrificial layer substance; performing a mask process for forming a fixed structure and a movable structure on the upper portion of the polysilicon and etching the polysilicon; capping a sidewall passivation oxide film on the upper portion of the fixed structure and the movable structure, and performing plasma etching, to remove the sacrificial layer substance; and performing plasma etching in a lower silicon undercut isotropic etching manner, to expand and form a space in which the sacrificial layer substance is removed. According to the invention, it is possible to prevent an error of a vehicle operation, it is possible to improve a defect of air bag development and sensitivity, it is possible to prevent a fixation phenomenon which may occur in the MEMS device, and it is possible to fundamentally suppress the occurrence of a positive electrostatic charge.