WAFER STORAGE APPARATUS HAVING GAS CHARGING UNITS AND SEMICONDUCTOR MANUFACTURING APPARATUS USING THE SAME

• Main Authors: CHOI, IN HO, SIM, YOUNG SUK
• Format: Patent
• Language: English; Korean
• Published: 30.07.2015
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

According to the present invention, a wafer storage apparatus comprises: a wafer stacking portion which encloses an internal space with an opened front side for receiving a plurality of wafers; a rear cover portion disposed on a rear side of the wafer stacking portion to prevent outside air from flowing into the internal space; and a gas charging portion injecting gas into the wafer stacking portion in a rear side wherein the rear cover portion is installed. 본 발명의 웨이퍼 스토리지 장치는 복수개의 웨이퍼들이 인입될 수 있게 전면이 개방된 내부 공간을 구비하고 상기 웨이퍼들을 적재할 수 있는 웨이퍼 적재부와, 상기 웨이퍼 적재부의 후면에 설치되어 상기 내부 공간에 외부 공기의 유입을 방지할 수 있는 후면 커버부와, 상기 후면 커버부가 설치된 후면측에서 상기 웨이퍼 적재부에 가스를 주입하여 충진할 수 있는 가스 충진부를 포함하여 이루어진다.