TRANSPARENT-CONDUCTIVE-FILM LAMINATE, MANUFACTURING METHOD THEREFOR, THIN-FILM SOLAR CELL, AND MANUFACTURING METHOD THEREFOR

• Main Authors: SOGABE KENTARO, YAMANOBE YASUNORI, MATSUMURA FUMIHIKO
• Format: Patent
• Language: English; Korean
• Published: 15.07.2015
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

고효율의 실리콘계 박막 태양 전지를 제조할 때에 표면 전극으로서 유용한, 광산란성이 우수한 요철 구조를 갖고, 광 밀폐 효과도 우수한 투명 도전막 적층체 및 그 제조 방법, 및 그 투명 도전막 적층체를 이용한 박막 태양 전지 및 그 제조 방법을 제공한다. 막 두께가 10 nm 이상 300 nm 이하인 산화인듐계 투명 도전막(I)과, 막 두께가 200 nm 이상인 산화아연계 투명 도전막(II)을 구비한 구조를 가지며, 또한 그 표면이, 오목부 및 볼록부가 혼재하는 결정 조직이고, 표면 거칠기(Ra)가 30 nm 이상이고, 헤이즈율이 8% 이상, 또한 저항치가 30 Ω/□ 이하인 투명 도전막 적층체로 한다. The invention provides a transparent-conductive-film laminate and manufacturing method therefor, transparent-conductive-film laminate being useful as a surface electrode in manufacture of a high-efficiency silicon-based thin-film solar cell, having a roughness structure excellent in light scattering, and having an excellent effect of optical confinement, and provides a thin-film solar cell using transparent-conductive-film laminate and a manufacturing method for the thin-film solar cell. Transparent-conductive-film laminate has a structure including: an indium-oxide-based transparent conductive film (I) having a film thickness of not less than 10 nm and not more than 300 nm; and a zinc-oxide-based transparent conductive film (II) having a film thickness of not less than 200 nm, and has a surface having a crystalline structure with projections and depressions mixed therein, a surface roughness (Ra) of not less than 30 nm, a haze ratio of not less than 8%, and a resistance value of not more than 30 /sq.