PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE

• Main Authors: ONGAYI OWENDI, THACKERAY JAMES W, JAIN VIPUL, CAMERON JAMES F
• Format: Patent
• Language: English; Korean
• Published: 29.06.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

A copolymer includes a repeating unit induced from an acid-unstable monomer, an aliphatic lactone-containing monomer, a C1-12 alkyl(meth)acrylate having C1-12 alkyl groups including a specific base-soluble group, a photoacid-generation monomer including aliphatic anion, and a neutral aliphatic monomer presenting a chemical formula. In the formula, R1, R2, R3, X, m, and Ar is the same as defined in the specification. The copolymer is used as a component of a photoresist composition. Disclosed are a coated substrate including a layer of a photoresist composition, and a method for forming an electronic device by using the coated substrate. 공중합체는 산-불안정성 단량체, 지방족 락톤-함유 단량체, C알킬기가 특정 염기-가용성기를 포함하는 C알킬 (메트)아크릴레이트, 지방족 음이온을 포함하는 포토애시드-발생 단량체, 및 하기 화학식을 나타내는 중성 방향족 단량체로부터 유도된 반복 단위를 포함한다:상기 식에서, R, R, R, X, m, 및 Ar은 명세서에 정의된 바와 같다. 공중합체는 포토레지스트 조성물의 성분으로 사용된다. 포토레지스트 조성물의 층을 포함하는 코팅된 기판, 및 코팅된 기판을 사용하여 전자 디바이스를 형성하는 방법이 기재된다.