CHEMICAL VAPOR DEPOSITION APPARATUS FOR FLAT DISPLAY

• Main Authors: AHN, HYO SANG, HAN, KYUNG ROC, PARK, MI SUNG
• Format: Patent
• Language: English; Korean
• Published: 22.05.2015
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Disclosed is a chemical vapor deposition apparatus for a flat panel display. According to an embodiment of the present invention, the chemical vapor deposition apparatus for the flat panel display comprises: a diffuser arranged in a chamber in which a deposition process progresses to a glass substrate for the flat panel display, and forming a plurality of penetration holes which provide deposition materials to surfaces of the glass substrate; a backing plate forming a buffer space between gas distributing plates, and arranged in parallel with the gas distributing plates in an upper area of the gas distributing plate; and an anti-deflection and RF power supply unit connected to the gas distributing plate, preventing deflection of the gas distributing plate, and RF (Radio Frequency) supplying power to the gas distributing plate. 평면디스플레이용 화학 기상 증착장치가 개시된다. 본 발명의 일 실시예에 따른 평면디스플레이용 화학 기상 증착장치는, 평면디스플레이용 유리기판에 대한 증착 공정이 진행되는 챔버 내에 배치되며, 유리기판의 표면으로 증착물질을 제공하는 다수의 통과공이 형성되는 가스분배판(diffuser); 가스분배판과의 사이에 버퍼공간이 형성되며, 가스분배판의 상부 영역에서 가스분배판과 나란하게 배치되는 백킹 플레이트(backing plate); 및 가스분배판에 연결되며, 가스분배판의 처짐을 방지하면서 가스분배판으로 RF(Radio Frequency) 전원을 공급하는 처짐 방지 겸용 RF 전원 공급유닛을 포함한다.